The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Apr. 08, 2013
Nanogram Corporation, Milpitas, CA (US);
Shivkumar Chiruvolu, San Jose, CA (US);
Igor Altman, Fremont, CA (US);
Bernard M. Frey, Livermore, CA (US);
Weidong Li, San Jose, CA (US);
Guojun Liu, San Jose, CA (US);
Robert B. Lynch, Livermore, CA (US);
Gina Elizabeth Pengra-Leung, San Jose, CA (US);
Uma Srinivasan, Mountain View, CA (US);
NanoGram Corporation, Milpitas, CA (US);
Abstract
Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.