The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Dec. 18, 2007
Weidong LI, San Jose, CA (US);
Shivkumar Chiruvolu, San Jose, CA (US);
Hui Du, Sunnyvale, CA (US);
Igor Altman, Fremont, CA (US);
Ronald J. Mosso, Fremont, CA (US);
Nobuyuki Kambe, Menlo Park, CA (US);
Weidong Li, San Jose, CA (US);
Shivkumar Chiruvolu, San Jose, CA (US);
Hui Du, Sunnyvale, CA (US);
Igor Altman, Fremont, CA (US);
Ronald J. Mosso, Fremont, CA (US);
Nobuyuki Kambe, Menlo Park, CA (US);
NanoGram Corporation, Milpitas, CA (US);
Abstract
Hollow silica nanoparticles can have well defined non-porous shells with low shell fragmentation and good dispersability. These well defined hollow particles can be formed through the controlled oxidation of silicon nanoparticles in an organic solvent. The hollow nanoparticles can have a submicron secondary particle sizes. The hollow silica nanoparticles can be incorporated into polymer composites, such as low index-of-refraction composites, for appropriate applications.