Wei-Yuan Jheng

Title: Innovations by Wei-Yuan Jheng in Semiconductor Technology

Introduction

Wei-Yuan Jheng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of devices with low leakage current. His work is essential for advancing the efficiency and performance of semiconductor devices.

Latest Patents

Wei-Yuan Jheng holds a patent for "Semiconductor devices with low leakage current and methods of fabricating the same." This patent outlines a method that includes providing a workpiece with a first hard mask layer on a substrate's top surface. The process involves performing an ion implantation to create a doped region in the substrate, followed by annealing the workpiece at a specific temperature. The method also details the selective removal of the hard mask layer and the subsequent epitaxial growth of a vertical stack of alternating channel layers and sacrificial layers on the substrate.

Career Highlights

Wei-Yuan Jheng is associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies that are pivotal in modern electronics.

Collaborations

Wei-Yuan Jheng has collaborated with notable colleagues, including Ming-Yuan Wu and Ka-Hing Fung. These collaborations have fostered innovation and development in semiconductor technologies.

Conclusion

Wei-Yuan Jheng's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as an influential inventor in the field. His innovations are crucial for the advancement of efficient semiconductor devices.