Dalin, Taiwan

Wei-Ya Wang

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei-Ya Wang. Retrieved from https://idiyas.com/inventor/wei-ya-wang-vox86822

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2007

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2 patents (USPTO):Explore Patents

Title: Innovations of Wei-Ya Wang in MEMS Technology

Introduction

Wei-Ya Wang is a prominent inventor based in Dalin, Taiwan. He has made significant contributions to the field of microelectromechanical systems (MEMS), particularly in the development of advanced mirror structures. With a total of 2 patents, his work showcases innovative approaches to MEMS technology.

Latest Patents

Wei-Ya Wang's latest patents include groundbreaking advancements in MEMS mirror structures. One of his notable inventions is the "Surface MEMS mirrors with oxide spacers." This patent describes a MEMS mirror structure formed using an etching process that creates sidewall oxide spacers while preserving the integrity of the oxide layer over the reflective layer. The design includes a reflective layer sandwiched between oxide layers, with a protective layer on top. The spacer oxide layer covers the structure, and oxide spacers are formed on the sidewalls using a selective etch process. This innovative approach ensures that the upper oxide layer remains intact, maintaining the functionality of the mirror structure.

Another significant patent is the "Spacer fabrication process for manufacturing reflective stealth mirrors and other MEMS devices." This method outlines the steps for creating a microelectromechanical system, such as a reflective stealth mirror. The process involves forming an I-shaped mirror structure, applying a spacer layer, and patterning the spacer layer to create at least one spacer along the side of the I-shaped mirror structure.

Career Highlights

Wei-Ya Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of MEMS technology. His work has garnered attention for its innovative solutions and practical applications in various industries.

Collaborations

Throughout his career, Wei-Ya Wang has collaborated with notable colleagues, including Fei-Yuh Chen and Yuh-Hwa Chang. These partnerships have contributed to the advancement of MEMS technology and the successful development of his patents.

Conclusion

Wei-Ya Wang's contributions to MEMS technology through his innovative patents highlight his expertise and dedication to the field. His work continues to influence advancements in microelectromechanical systems, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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