The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Dec. 02, 2004
Shan-hua Wu, Hukou Township, Hsinchu County, TW;
Fei-yun Chen, Hinchu, TW;
Wei-ya Wang, Dalin Township, Chiayi County, TW;
Hung-hsin Liu, Hsinchu, TW;
Sheng-liang Pan, Hsin-Chu, TW;
Shan-Hua Wu, Hukou Township, Hsinchu County, TW;
Fei-Yun Chen, Hinchu, TW;
Wei-Ya Wang, Dalin Township, Chiayi County, TW;
Hung-Hsin Liu, Hsinchu, TW;
Sheng-Liang Pan, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan, CN;
Abstract
A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.