Wei Wan

Title: Wei Wan - Innovator in Charge Pump Regulation

Introduction

Wei Wan is a notable inventor based in Guangzhou, China. He has made significant contributions to the field of electrical engineering, particularly in the development of charge pump regulators. His innovative approach has led to the creation of a patent that enhances the efficiency and reliability of these devices.

Latest Patents

Wei Wan holds a patent for a "Current Limiter for a Charge Pump Regulator." This invention provides a current limiter and a charge pump regulator that converts an input voltage to an output voltage. The design includes a feedback loop with a first transistor that regulates the discharge current from the charge pump regulator. The current limiter is designed to limit the current provided by the charge pump regulator. It features a sampling block that samples the first drain-source voltage of the first transistor and holds it as a reference drain-source voltage. Additionally, an adaptive tracking block generates a maximum voltage based on the reference drain-source voltage, ensuring that the maximum voltage tracks the reference. A voltage clamp block is also included to clamp a feedback voltage to the maximum voltage, providing the clamped voltage as a first gate-source voltage of the first transistor.

Career Highlights

Throughout his career, Wei Wan has worked with prominent companies in the technology sector. He has been associated with Nexperia B.V. and Nexperia Technology (Shanghai) Ltd., where he has contributed to various projects and innovations in semiconductor technology.

Collaborations

Wei Wan has collaborated with several professionals in his field, including his coworker Zhicheng Hu. Their joint efforts have further advanced the development of innovative technologies in charge pump regulation.

Conclusion

Wei Wan's contributions to the field of electrical engineering, particularly through his patent on charge pump regulators, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.