Company Filing History:
Years Active: 2019-2021
Title: Innovations of Wei Si in Semiconductor Technology
Introduction
Wei Si is a prominent inventor based in Singapore, known for his contributions to semiconductor technology. He has been awarded 3 patents for his innovative work, particularly in the field of trench capacitors.
Latest Patents
One of Wei Si's latest patents is titled "Power trench capacitor compatible with deep trench isolation process." This invention provides a method for forming a trench capacitor without the need for an additional mask adder. The process includes several steps, such as forming a buried implant layer over a substrate, followed by the creation of an EPI layer, an oxide layer, and a nitride layer. The invention also details the formation of first and second trenches, where the first trench is wider and deeper than the second. A dielectric layer is formed in the trenches, and a first polysilicon layer is placed over the dielectric layer. The method concludes with the removal of the first polysilicon layer and the dielectric layer above the EPI layer, followed by the formation of a second polysilicon layer that fills the first trench and extends above the EPI layer in the second trench.
Career Highlights
Wei Si is currently employed at Globalfoundries Singapore Pte. Ltd., where he continues to push the boundaries of semiconductor innovation. His work has significantly impacted the efficiency and effectiveness of trench capacitor technology.
Collaborations
Wei Si collaborates with talented individuals in his field, including Zeng Wang and Jeoung Mo Koo. Their combined expertise fosters a creative environment that leads to groundbreaking advancements in technology.
Conclusion
Wei Si's contributions to semiconductor technology, particularly through his innovative patents, highlight his role as a leading inventor in the industry. His work continues to influence the development of efficient semiconductor devices.