Chang-Hua Hsien, Taiwan

Wei-Shun Lai


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations of Wei-Shun Lai: A Pioneer in Wear-Resistant Dielectric Layer Technology

Introduction: Wei-Shun Lai, an accomplished inventor based in Chang-Hua Hsien, Taiwan, has made significant contributions to the field of semiconductor technology. With a focus on enhancing the durability and performance of semiconductor devices, Lai holds a patent that demonstrates his innovative approach to improving dielectric layers.

Latest Patents: Wei-Shun Lai's patent, titled "Method of forming a wear-resistant dielectric layer," describes a novel process for creating a dielectric layer on a substrate that includes multiple semiconductor devices and contact pads. The process begins with the provision of a substrate with contact pads on its surface, followed by a surface treatment involving plasma etching. Subsequently, a plasma enhanced chemical vapor deposition (PECVD) process is conducted in a high frequency/low frequency alternating manner to develop a robust dielectric layer. The method further includes forming a masking pattern and performing an anisotropic etching process, resulting in openings in the dielectric layer that expose the contact pads with outwardly-inclined sidewalls.

Career Highlights: Wei-Shun Lai is associated with Touch Micro-system Technology Corp., where his expertise contributes to the advancement of micro-system technologies. His work is pivotal in enhancing the reliability and functionality of semiconductor devices in various applications.

Collaborations: Throughout his career, Wei-Shun Lai has collaborated with notable colleagues, including Shu-Hua Hu and Kuan-Jui Huang. Their combined expertise facilitates innovative research and development efforts within the company, fostering an environment where groundbreaking inventions can flourish.

Conclusion: Wei-Shun Lai's dedication to improving dielectric layer technology reflects his commitment to innovation in the semiconductor industry. His patent not only showcases his inventive spirit but also contributes to the ongoing advancement of technology in micro-systems, marking him as a prominent figure in the field.

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