Taiwan, China

Wei Pang Chen

This inventor holds 1 USPTO granted patent. Top assignee: Nexchip Semiconductor Corporation. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Wei Pang Chen: Innovator in Semiconductor Technology

Introduction: Wei Pang Chen is a prominent inventor based in Taiwan, known for his contributions to semiconductor technology. With a focus on innovative manufacturing methods, he has made significant strides in the field.

Latest Patents: Wei Pang Chen holds a patent for a semiconductor device and its manufacturing method. This invention includes a substrate, a shallow trench isolation structure, a dielectric layer, a gate, a source, and a drain. The design features a substrate that consists of a first region and a second region, with the shallow trench isolation structure positioned on both regions. The dielectric layer is strategically placed in an opening formed by the isolation structure, with varying heights in different regions. The gate is situated on the dielectric layer, while the source and drain are positioned on either side of the gate.

Career Highlights: Wei Pang Chen is currently employed at Nexchip Semiconductor Corporation, where he continues to advance semiconductor technologies. His work has been instrumental in developing efficient manufacturing processes that enhance device performance.

Collaborations: Wei has collaborated with notable colleagues in the industry, including Chih-nan Wu and Chi-cherng Jeng, contributing to various projects that push the boundaries of semiconductor innovation.

Conclusion: Wei Pang Chen's work in semiconductor technology exemplifies the spirit of innovation and collaboration in the field. His patent and ongoing contributions at Nexchip Semiconductor Corporation highlight his role as a key player in advancing semiconductor manufacturing methods.

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