Wei-Lin Sun

Title: Wei-Lin Sun: Innovator in Semiconductor Manufacturing

Introduction

Wei-Lin Sun is a notable inventor based in Villach, Austria. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods and techniques. His work has implications for the efficiency and effectiveness of semiconductor devices.

Latest Patents

Wei-Lin Sun holds a patent for a method of manufacturing a trench oxide in a trench for a gate structure in a semiconductor substrate. This patent outlines a process that includes generating a trench in the semiconductor substrate, creating an oxide layer over the trench's sidewalls, and employing ion implantation to damage part of the oxide layer. The method further involves coating the oxide layer with an etching mask, generating openings in the mask, and etching the oxide layer to achieve the desired depth. This innovative approach enhances the manufacturing process of semiconductor devices.

Career Highlights

Wei-Lin Sun is currently employed at Infineon Technologies AG, a leading company in the semiconductor industry. His work at Infineon has allowed him to apply his expertise in semiconductor manufacturing and contribute to the development of advanced technologies. His patent reflects his commitment to innovation and excellence in his field.

Collaborations

Wei-Lin Sun has collaborated with notable colleagues, including Moriz Jelinek and Kang Nan Khor. These collaborations have likely fostered an environment of innovation and shared knowledge, further enhancing the quality of their work in semiconductor technology.

Conclusion

Wei-Lin Sun's contributions to semiconductor manufacturing through his patented methods demonstrate his role as a key innovator in the industry. His work continues to influence the development of efficient semiconductor devices, showcasing the importance of innovation in technology.