Shin-Chu Hsien, Taiwan

Wei-Kay Chiu


Average Co-Inventor Count = 1.3

ph-index = 3

Forward Citations = 25(Granted Patents)


Location History:

  • Chin-Chu County, TW (1998)
  • Pao-Shan-Hriang, TW (1998)
  • Pao-San Shiang, TW (2000)
  • Shin-Chu Hsien, TW (2002 - 2003)
  • Hsin-Chu, TW (1999 - 2005)

Company Filing History:


Years Active: 1998-2005

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13 patents (USPTO):Explore Patents

Title: Innovations of Wei-Kay Chiu

Introduction

Wei-Kay Chiu is a prominent inventor based in Shin-Chu Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on improving processes and efficiencies in semiconductor manufacturing.

Latest Patents

One of his latest inventions is related to wafer alignment marks protected by photoresist. In this invention, a coating of unexposed photoresist is used to protect the area immediately above a zero layer alignment mark used for wafer stepper alignment. The entire surface of a wafer is coated with photoresist, and all shot sites on the surface, including those containing the zero layer alignment marks, are exposed with circuit patterns. Before the exposed areas of photoresist are removed, a protective coating of unexposed photoresist is applied to the surface of the wafer immediately above the alignment marks but within the boundaries of the shot site. The wafer is processed in the areas outside of the protective coating, including the shot site containing alignment marks. The area under the protective coating is not processed, maintaining a clear view of the alignment marks. This method improves yield in the shot sites surrounding the alignment sites and reduces alignment errors.

Another notable patent is the photoexposure method for facilitating photoresist stripping. In this process, a substrate and a target layer are first provided. A patterned positive photoresist layer is then formed upon the target layer. The target layer is processed while employing the patterned positive photoresist layer as a mask, resulting in a processed target layer and a processed patterned positive photoresist layer. The processed patterned positive photoresist layer is photoexposed to enhance its solubility. Finally, the photoexposed processed patterned positive photoresist layer is stripped from the processed target layer using a solvent.

Career Highlights

Wei-Kay Chiu is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to innovate and contribute to advancements in semiconductor technology. His work has been instrumental in enhancing manufacturing processes and improving product quality.

Collaborations

Throughout his career, Wei-Kay has collaborated with notable colleagues, including Chao-Chen Chen and Chen-Yu Chang. These collaborations have further enriched his contributions to the field.

Conclusion

Wei-Kay Chiu's innovative patents and

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