Company Filing History:
Years Active: 2017
Title: Innovations by Wei-Hua Tong in Semiconductor Technology
Introduction
Wei-Hua Tong is a notable inventor based in Mechanicville, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming trench silicides. His innovative approaches have the potential to enhance device performance and yield.
Latest Patents
Wei-Hua Tong holds a patent titled "Forming self-aligned NiSi placement with improved performance and yield." This patent discloses methods for forming a trench silicide without gouging the silicon source/drain regions. The embodiments of this invention include forming first and second dummy gates with spacers, creating eSiGe source/drain regions, and forming raised source/drain regions. Additionally, it involves forming a silicon cap on each of the regions and replacing the dummy gates with high-k metal gate (HKMG) structures.
Career Highlights
Wei-Hua Tong is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work at the company focuses on advancing semiconductor fabrication techniques. With a patent portfolio that includes 1 patent, he continues to contribute to the innovation landscape in the semiconductor industry.
Collaborations
Wei-Hua Tong collaborates with talented professionals in his field, including Xusheng Kevin Wu and Yue Hu. These collaborations enhance the research and development efforts at GlobalFoundries Inc., fostering an environment of innovation.
Conclusion
Wei-Hua Tong's contributions to semiconductor technology exemplify the impact of innovative thinking in the industry. His patent work and collaborations highlight the importance of continuous advancement in technology.