Company Filing History:
2 out of 1,724 
2 out of 934 Years Active: 2021-2023
Title: Innovator Wei Hu Zhang: Pioneering Semiconductor Device Technologies
Introduction
Wei Hu Zhang is a prominent inventor based in Shanghai, China, recognized for his contributions to the field of semiconductor devices. With a total of two patents to his name, Zhang has made significant strides in the development of advanced semiconductor technologies.
Latest Patents
His latest innovations include a patent for a semiconductor device, which features a substrate and a unique gate structure. This gate structure comprises a first gate oxide layer with a sloped sidewall on one side and a vertical sidewall on the other, topped with a second gate oxide layer. The design allows for an innovative thickness variation between the first and second gate oxide layers, which enhances the overall functionality of the semiconductor device.
Another notable patent details the method for forming a semiconductor device. This method involves providing a substrate, followed by the formation of oxide layers, including multiple first gate oxide layers that are etched for precision. The process concludes with the etching of the first oxide layers and silicon layer to define the gate structures, each characterized by sloped sidewalls and varying thicknesses, thereby optimizing design and performance.
Career Highlights
Wei Hu Zhang has built a robust career in the semiconductor industry. He has worked with the Semiconductor Manufacturing International Corporation in both Shanghai and Beijing, where he has honed his expertise in semiconductor technologies and innovation. His work at these corporations has been fundamental in advancing semiconductor manufacturing processes.
Collaborations
Throughout his career, Zhang has collaborated with esteemed colleagues such as Hu Wang and Shan Shan Wang. These partnerships have facilitated knowledge exchange and contributed to the successful development of his patented technologies.
Conclusion
In summary, Wei Hu Zhang is a notable figure in the realm of semiconductor innovation. His inventive approach to the design and formation of semiconductor devices not only enhances technology but also positions him as a key contributor to advancements in the industry. His patents and ongoing collaborations serve as a testament to his commitment to pushing the boundaries of semiconductor technology in Shanghai and beyond.