Wei-Hao Lee

Title: Innovations of Wei-Hao Lee in Extreme Ultraviolet Mask Technology

Introduction

Wei-Hao Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of extreme ultraviolet (EUV) mask technology. His innovative work has implications for the future of lithography in the semiconductor industry.

Latest Patents

Wei-Hao Lee holds a patent for an extreme ultraviolet mask with a capping layer. This patent describes an EUV mask that includes a substrate, a reflective multilayer stack on the substrate, and a capping feature that can be either a single layer or multi-layer on the reflective multilayer stack. The capping feature is designed with a material that has an amorphous structure. Additionally, the patent outlines embodiments where the capping layers contain elements with a first solid carbon solubility of less than about 3. In multilayer capping feature embodiments, the elements of the respective capping layers exhibit different solid carbon solubility properties.

Career Highlights

Wei-Hao Lee is associated with Taiwan Semiconductor Manufacturing Co., Ltd., a leading company in the semiconductor industry. His work at TSMC has positioned him at the forefront of technological advancements in semiconductor manufacturing processes.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Wei-Hao Lee's contributions to extreme ultraviolet mask technology reflect his innovative spirit and expertise in the semiconductor field. His patent on the EUV mask with a capping layer showcases the potential for advancements in lithography techniques.