Wei-Gang Chiu

Title: Innovations of Wei-Gang Chiu

Introduction

Wei-Gang Chiu is a prominent inventor based in New Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of nine patents. His work focuses on advancements in thin film transistors, which are crucial for modern electronic devices.

Latest Patents

Among his latest patents is a groundbreaking invention titled "Transistor including a hydrogen-diffusion barrier and methods for forming the same." This patent describes a thin film transistor that features a gate electrode embedded in an insulating layer over a substrate. The design includes a gate dielectric, an active layer made of compound semiconductor material, and source and drain electrodes that contact the active layer. Notably, the gate dielectric has thicker portions at the interfaces with the insulating layer to suppress hydrogen diffusion. Additionally, a passivation capping dielectric may be used to further mitigate hydrogen diffusion.

Another notable patent is the "Thin film transistor featuring variable thickness glue layer with tapered end." This semiconductor device comprises a substrate, a gate electrode, a gate dielectric layer, a channel layer, and source and drain electrodes. The innovative aspect of this design is the variable thickness of the glue layer adjacent to the sidewall of the metal pattern, which enhances the performance of the transistor.

Career Highlights

Wei-Gang Chiu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His