Wei-e Wang

Title: Innovations of Wei-e Wang in Semiconductor Technology

Introduction

Wei-e Wang is a notable inventor based in Overijse, Belgium. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced materials and manufacturing methods. With a total of two patents to his name, his work has implications for the future of high mobility semiconductor devices.

Latest Patents

Wei-e Wang's latest patents include innovative methods for manufacturing III-V compound semiconductor materials. One patent focuses on an antiphase domain boundary-free III-V compound semiconductor material on a semiconductor substrate. This method involves providing a substrate with a first semiconductor material and an insulating layer, followed by the formation of a buffer layer and thermally annealing the substrate. The result is a rounded, double-stepped surface that enhances the semiconductor's properties. Another patent addresses the reduction of Fermi Level Pinning in non-silicon channel MOS devices. This method utilizes atomic hydrogen to passivate the interface of high mobility semiconductor compounds, improving the characteristics of MOS devices.

Career Highlights

Throughout his career, Wei-e Wang has worked with prominent research institutions, including Imec and Katholieke Universiteit Leuven. His experience in these organizations has allowed him to collaborate on cutting-edge research and development projects in semiconductor technology.

Collaborations

Wei-e Wang has collaborated with notable colleagues such as Han Chung Lin and Marc A Meuris. These partnerships have contributed to the advancement of semiconductor research and innovation.

Conclusion

Wei-e Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor materials and devices.