Singapore, Singapore

Wei Chun Lim

This inventor holds 4 USPTO granted patents and 3 published patent applications. Top assignees: Applied Materials, Inc., Hewlett-Packard Development Company, L.p., National University of Singapore. Active years: 2006-2026.

USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 4.2

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2006-2026

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4 patents (USPTO):Explore Patents

Title: Innovations by Wei Chun Lim

Introduction

Wei Chun Lim is a notable inventor based in Singapore, known for his contributions to the field of technology. He holds a total of 4 patents, showcasing his innovative spirit and expertise in his domain. His work has significantly impacted the industry, particularly in the development of advanced materials and processes.

Latest Patents

One of his latest patents is titled "In Situ Acyclic Diamino Carbene (ADC) Deposition." This invention reflects his commitment to pushing the boundaries of technology and improving manufacturing processes. His patents demonstrate a deep understanding of material science and its applications in various industries.

Career Highlights

Wei Chun Lim has had a distinguished career, working with prominent companies such as Applied Materials, Inc. and Hewlett-Packard Development Company, L.P. His experience in these organizations has allowed him to collaborate with some of the brightest minds in the field, further enhancing his skills and knowledge.

Collaborations

Throughout his career, Wei has worked alongside talented individuals, including Andrea Leoncini and Sara Raquel Mota Merelo De Aguiar. These collaborations have contributed to his innovative projects and have fostered a creative environment for developing new ideas.

Conclusion

Wei Chun Lim's contributions to technology and innovation are commendable. His patents and career achievements reflect his dedication to advancing the field and his ability to collaborate effectively with others. His work continues to inspire future inventors and innovators.

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