Los Altos, CA, United States of America

Wei Chang

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Chang. Retrieved from https://idiyas.com/inventor/wei-chang-x43j9549

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Wei Chang - Innovator in Vacuum Pumping Technology

Introduction

Wei Chang is a notable inventor based in Los Altos, California. He has made significant contributions to the field of vacuum pumping technology, particularly in improving the planarity of support plates used during the deposition of films onto substrates.

Latest Patents

Wei Chang holds a patent for a method titled "Susceptor Shaft Vacuum Pumping." This innovative method enhances the planarity of a support plate of a susceptor by reducing pressure in a hollow core of a shaft below atmospheric levels. The process also involves lowering the pressure in the deposition chamber to facilitate the deposition of material onto a substrate. The interaction between the pressures in the hollow core and the deposition chamber effectively improves the planarity of the support plate.

Career Highlights

Wei Chang is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing technologies that enhance manufacturing processes and product quality.

Collaborations

Wei has collaborated with talented coworkers such as Sanjay D. Yadav and Quanyuan Shang, contributing to various projects that push the boundaries of innovation in their field.

Conclusion

Wei Chang's contributions to vacuum pumping technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Applied Materials, Inc. highlight his role as a key player in advancing manufacturing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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