The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Aug. 03, 2001
Sanjay Yadav, Redwood City, CA (US);
Quanyuan Shang, Saratoga, CA (US);
Ernst Keller, Sunnyvale, CA (US);
Wei Chang, Los Altos, CA (US);
Sanjay Yadav, Redwood City, CA (US);
Quanyuan Shang, Saratoga, CA (US);
Ernst Keller, Sunnyvale, CA (US);
Wei Chang, Los Altos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Provided herein is a method of improving the planarity of a support plate of a susceptor for use during deposition of a film of material onto a substrate comprising the steps of reducing pressure in a hollow core of a shaft to a level below atmospheric pressure; and reducing a pressure in the deposition chamber to a level required for the deposition of the film of material onto the substrate, where the pressure in the hollow core of the shaft acts upon a lower surface of the support plate connected to the shaft and interfacing with the hollow core of the shaft and the pressure in the deposition chamber acts upon an upper surface of the support plate adapted to support the substrate thereby improving planarity. Also provided are a susceptor and a method of depositing a film onto a substrate affixed to the susceptor of the present invention.