Princeton, NJ, United States of America

Wei Cai

This inventor holds 1 USPTO granted patent. Top assignee: Princeton University. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Cai. Retrieved from https://idiyas.com/inventor/wei-cai-xq7hj3cj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Wei Cai - Innovator in Scanning Probe Lithography

Introduction

Wei Cai is a prominent inventor based in Princeton, NJ (US). He has made significant contributions to the field of nanofabrication through his innovative patent. His work focuses on advancing the capabilities of scanning probe lithography methods.

Latest Patents

Wei Cai holds a patent titled "Scanning probe lithography methods utilizing an enclosed sinusoidal pattern." This patent encompasses various technologies, including a scanning electron microscope, scanning transmission electron microscope, focused ion beam microscope, ion beam micromachining device, and scanning probe nanofabrication device. The invention is designed to move a substrate and a scanning modality relative to one another along an enclosed sinusoidal trajectory, enhancing the methods of operation in nanofabrication.

Career Highlights

Wei Cai is affiliated with Princeton University, where he continues to engage in cutting-edge research and development. His work has positioned him as a key figure in the field of nanotechnology, contributing to advancements that have practical applications in various industries.

Collaborations

Wei Cai collaborates with fellow researchers, including Nan Yao, to further explore and develop innovative technologies in the realm of nanofabrication.

Conclusion

Wei Cai's contributions to scanning probe lithography exemplify the impact of innovative thinking in advancing technology. His work at Princeton University continues to inspire future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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