The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Aug. 12, 2016
Applicant:
The Trustees of Princeton University, Office of Technology and Trademark Licensing, Princeton, NJ (US);
Assignee:
The Trustees of Princeton University, Office of Technology and Trademark Licensing, Princeton, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/28 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); H01J 2237/2602 (2013.01); H01J 2237/3175 (2013.01);
Abstract
Provided among other things are a scanning electron microscope, scanning transmission electron microscope, focused ion beam microscope, ion beam micromachining device, or scanning probe nanofabrication device, wherein the microscope or device is configured to move a substrate and a scanning modality relative to one another with an enclosed sinusoidal trajectory, and methods of operation.
Yao, Nan. (2018). Scanning probe lithography methods utilizing an enclosed sinusoidal pattern (U.S. Patent No. 9911574). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9911574
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile