This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 1992.
Company Filing History:
Years Active: 1992
Title: Wayne A Mattingly: Innovator in Semiconductor Polishing Technology
Introduction
Wayne A Mattingly is a notable inventor based in Rio Rancho, NM (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing processes. His innovative approach has led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
Wayne A Mattingly holds a patent for a "Method for conditioning the surface of a polishing pad." This patent describes an improved method for conditioning the surface of a pad used in polishing dielectric layers formed on semiconductor substrates. In this method, the serrated edge of an elongated blade member is placed in radial contact with the polishing pad's surface. The table and pad are rotated relative to the blade member while the blade is pressed downward against the pad surface. This action creates a series of circumferential grooves in the pad, which facilitate the polishing process by increasing the pad area and allowing more slurry to be applied to the substrate per unit area. The method optimizes the downward force and rotational speed to achieve the desired polishing rate and uniformity.
Career Highlights
Wayne A Mattingly is associated with Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has allowed him to contribute to cutting-edge technologies that are essential for modern electronics. His innovative methods have been instrumental in improving the quality and efficiency of semiconductor devices.
Collaborations
Wayne has collaborated with notable colleagues such as Seiichi Morimoto and Spencer E Preston. These collaborations have fostered an environment of innovation and have led to advancements in semiconductor polishing techniques.
Conclusion
Wayne A Mattingly's contributions to semiconductor polishing technology exemplify the impact of innovation in the field. His patented methods have enhanced the manufacturing processes that are crucial for the electronics industry. His work continues to influence the development of more efficient semiconductor technologies.