Chino, Japan

Wataru Takahashi



Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Nagano, JP (1998 - 1999)
  • Suwa, JP (2019)
  • Chino, JP (2010 - 2022)

Company Filing History:


Years Active: 1998-2022

Loading Chart...
Loading Chart...
8 patents (USPTO):Explore Patents

Title: Wataru Takahashi: Innovator in Liquid Ejecting Technology

Introduction

Wataru Takahashi is a prominent inventor based in Chino, Japan. He has made significant contributions to the field of liquid ejecting technology, holding a total of 8 patents. His work has been instrumental in advancing the capabilities of liquid ejecting heads and apparatuses.

Latest Patents

Takahashi's latest patents include innovative designs for liquid ejecting heads and liquid ejecting apparatuses. One of his notable inventions features a liquid ejecting head that comprises a flow path substrate, a diaphragm, and a drive device. This design allows for efficient pressure changes within the pressure chamber, enhancing the ejection process. Another patent describes a structure with multiple stacked plates, where the plates have different coefficients of linear expansion. This unique configuration improves the performance and reliability of the liquid ejecting head.

Career Highlights

Wataru Takahashi is currently employed at Seiko Epson Corporation, where he continues to develop cutting-edge technologies. His expertise in liquid ejecting systems has positioned him as a key player in the industry. Throughout his career, he has focused on creating solutions that meet the evolving needs of printing and liquid ejection applications.

Collaborations

Takahashi has collaborated with notable colleagues, including Mitsuyoshi Soyama and Masahiro Kanai. Their combined efforts have led to advancements in liquid ejecting technology, further solidifying their contributions to the field.

Conclusion

Wataru Takahashi's innovative work in liquid ejecting technology has made a lasting impact on the industry. His patents and collaborations reflect his commitment to advancing this essential technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…