Kyoto, Japan

Wataru Nishida

This inventor holds 1 USPTO granted patent. Top assignee: S-Tec Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wataru Nishida. Retrieved from https://idiyas.com/inventor/wataru-nishida-l72xz2mm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Wataru Nishida: Innovator in Semiconductor Manufacturing

Introduction

Wataru Nishida is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and patents. His work focuses on enhancing the efficiency and effectiveness of manufacturing processes.

Latest Patents

Wataru Nishida holds a patent for a liquid material evaporation apparatus specifically designed for semiconductor manufacturing. This apparatus includes a mixing chamber, a flow control unit, and multiple flow passages that facilitate the introduction of liquid materials and carrier gases. The design inhibits backflow and ensures efficient evaporation of mixed gases, which is crucial for semiconductor production.

Career Highlights

Nishida's career is marked by his dedication to advancing semiconductor technology. His innovative patent reflects his expertise and commitment to improving manufacturing processes. He works at S-tec Corporation, where he continues to develop solutions that address industry challenges.

Collaborations

Wataru Nishida collaborates with talented individuals such as Hideaki Miyamoto and Tetsuo Shimizu. Their combined efforts contribute to the advancement of technology in the semiconductor field.

Conclusion

Wataru Nishida is a key figure in semiconductor manufacturing, with a focus on innovative solutions that enhance production efficiency. His contributions through patents and collaborations highlight his importance in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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