The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2006

Filed:

Mar. 11, 2003
Applicants:

Hideaki Miyamoto, Kyoto, JP;

Wataru Nishida, Kyoto, JP;

Tetsuo Shimizu, Kyoto, JP;

Inventors:

Hideaki Miyamoto, Kyoto, JP;

Wataru Nishida, Kyoto, JP;

Tetsuo Shimizu, Kyoto, JP;

Assignee:

STEC Inc., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 1/14 (2006.01); B01D 1/30 (2006.01); B01F 3/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A liquid material evaporation apparatus including a mixing chamber, a flow control unit, a first flow passage for introducing a liquid material, a second flow passage for introducing a carrier gas connected to the mixing chamber through a first nozzle, the first nozzle inhibiting backflow from the mixing chamber into the second flow passage. A third flow passage for discharging evaporated mixed gas is connected to the mixing chamber through a second nozzle, the mixed liquid material and carrier gas being forced through the second nozzle by the flow control unit, the mixed liquid material and carrier gas depressurizing after passing through the second nozzle to evaporate into a mixed gas in the third flow passage. Heat is applied to the mixing chamber and the second and third flow passages to enhance mixing in the mixing chamber and to avoid condensation in the third flow passage.


Find Patent Forward Citations

Loading…