Company Filing History:
Years Active: 2000-2001
Title: Wataru Igarashi: Innovator in Semiconductor Technology
Introduction
Wataru Igarashi is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advancing the design and production methods of semiconductor devices.
Latest Patents
Igarashi's latest patents include a semiconductor device and method for producing the same. This innovative semiconductor device comprises a semiconductor substrate and a field oxide film formed within it. The design features a pair of MOS transistors located in element forming regions on both sides of the field oxide film. Each transistor includes a gate oxide film, a gate electrode, and a pair of source/drain regions. Additionally, an interlayer insulating film covers the semiconductor substrate, field oxide film, and transistors. A local interconnect is formed by embedding a conductive material in a first opening in the interlayer insulating film, which is strategically arranged above the field oxide film. This design allows for electrical connections between the source/drain regions of the transistors, enhancing the device's functionality.
Career Highlights
Wataru Igarashi is currently employed at Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to collaborate with other talented professionals in the field, furthering advancements in semiconductor technology.
Collaborations
One of his notable coworkers is Yasuo Naruke, with whom he has worked closely on various projects. Their collaboration has contributed to the development of innovative semiconductor solutions.
Conclusion
Wataru Igarashi's contributions to semiconductor technology through his patents and work at Toshiba highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future developments.