Miyagi, Japan

Wataru Hashizume


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Wataru Hashizume: Innovator in Plasma Etching Technology

Introduction: Wataru Hashizume is a notable inventor based in Miyagi, Japan, recognized for his contributions to plasma etching technology. With a patent to his name, he has significantly impacted the field of semiconductor manufacturing and etched a niche for himself in the innovation sector.

Latest Patents: Hashizume holds a patent for a plasma etching method that enhances the efficiency and precision of etching processes in semiconductor fabrication. This method includes a series of steps: initially etching an intermediate layer of silicon and nitrogen beneath a resist mask to expose the silicon layer underneath, followed by the introduction of chlorine gas to promote reaction product attachment onto the sidewalls of the openings in both the resist mask and the intermediate layer. Finally, a portion of the silicon layer is etched using a process gas composed of sulfur and fluorine, resulting in the formation of a recess in the silicon layer. This innovative approach greatly optimizes the etching procedure.

Career Highlights: Wataru Hashizume is currently employed at Tokyo Electron Limited, a prominent player in the semiconductor equipment industry. His work at the company showcases his commitment to advancing technology and improving fabrication processes through innovative solutions. Throughout his career, Hashizume has demonstrated a keen ability to merge theoretical knowledge with practical application.

Collaborations: In his professional journey, Hashizume has collaborated with talented coworkers like Kazuhito Tohnoe and Yusuke Hirayama. Together, they contribute to enhancing the company's offerings and driving technological advancements in the semiconductor sector, fostering an environment of innovation and teamwork.

Conclusion: Wataru Hashizume exemplifies the spirit of innovation in the semiconductor industry. His expertise in plasma etching has not only led to a patented process but also showcases the importance of collaboration and teamwork in achieving breakthroughs. As technology evolves, Hashizume's contributions will continue to play a vital role in shaping the future of semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…