Warren T Yu

Title: Innovations of Warren T Yu

Introduction

Warren T Yu is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of semiconductor technology. He holds a total of 6 patents, showcasing his expertise and innovative spirit in the industry.

Latest Patents

One of his latest patents is titled "Exposure correction based on reflective index for photolithographic process control." This invention addresses critical dimension variation of photolithographically formed features on a semiconductor substrate. By measuring the reflectivity of a photoresist layer and an underlying layer, such as a polysilicon layer, he enables precise control of feature width on the photoresist. This innovation allows for accurate etching of the underlying layer to form features like gate electrodes. Another notable patent is the "Method of using critical dimension mapping to qualify a new integrated circuit manufacturing process." This method improves the quality of semiconductor products by mapping critical dimensions of predetermined features at various stages of the manufacturing process. The data collected from these mappings allows for adjustments in the manufacturing process to enhance the quality of the end product.

Career Highlights

Warren T Yu is currently employed at Advanced Micro Devices Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing manufacturing processes and improving product quality.

Collaborations

He has collaborated with notable coworkers such as Jayendra D Bhakta and Zicheng Gary Ling, contributing to a dynamic and innovative work environment.

Conclusion

Warren T Yu's contributions to semiconductor technology through his patents and work at Advanced Micro Devices Corporation highlight his role as a key innovator in the field. His inventions not only enhance manufacturing processes but also improve the overall quality of semiconductor products.