The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2002
Filed:
Mar. 08, 1999
Warren T. Yu, San Jose, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
In order to improve the quality of a semiconductor product, mapping of the critical dimension of predetermined features such as ring oscillators, test transistors, turning forks WET transistors etc., is carried out at various stages of the process. For example, a reticle can be mapped, the etch mask which is produced from the effect of the image on the resist layer, and the results of the etching can be respectively mapped. The data gleaned from these mappings is used to determine from the end result if the reticle requires modification to change the resulting etch mask and modify the end product. Thus, when a new reticle is introduced to the process, it is possible to run the process and then work back via the collected critical dimension data to determined what changes in the reticle are appropriate in order to improve the end result.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile