Wanli Yang

Title: Wanli Yang - Innovator in Defect Detection Technology

Introduction

Wanli Yang is a prominent inventor based in Foshan, China. He has made significant contributions to the field of defect detection technology, particularly in the semiconductor industry. His innovative approach has led to the development of a unique method for identifying defects in wafers, which is crucial for ensuring the quality and reliability of electronic components.

Latest Patents

Wanli Yang holds a patent for a "Defect detection method, apparatus and device, and computer-readable storage medium." This patent outlines a comprehensive defect detection method that includes acquiring a photoluminescence detection result of a wafer to be detected. The process involves generating a defect heat map corresponding to the wafer based on the photoluminescence detection result and a preset heat map model. This model is constructed using a sample of photoluminescence detection results after electroluminescent defect marking. Ultimately, the method determines a defect detection result of the wafer according to the generated defect heat map. He has 1 patent to his name.

Career Highlights

Wanli Yang is currently employed at Ji Hua Laboratory, where he continues to advance his research and development efforts in defect detection technologies. His work is instrumental in enhancing the accuracy and efficiency of defect identification in semiconductor manufacturing processes.

Collaborations

Wanli Yang collaborates with notable colleagues, including Zhaoming He and Hai Bi. Their combined expertise contributes to the innovative projects at Ji Hua Laboratory, fostering a collaborative environment that drives technological advancements.

Conclusion

Wanli Yang's contributions to defect detection technology exemplify the importance of innovation in the semiconductor industry. His patented methods are paving the way for improved quality control in electronic manufacturing.