Hsinchu, Taiwan

Wan-Li Cheng


Average Co-Inventor Count = 1.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1999

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovations by Wan-Li Cheng

Introduction

Wan-Li Cheng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the cleaning and etching processes of wafers. With a total of two patents to his name, Cheng's work has had a considerable impact on the industry.

Latest Patents

Cheng's latest patents include an "Apparatus for removing particles from a wafer and for cleaning the wafer." This invention features a container for storing liquid and holding a semiconductor wafer. It incorporates a transducer and a sonic generator to transfer megasonic waves into the container. The design includes a drain for releasing liquid, outlet openings at the bottom, and liquid inlets that provide liquid to the container. Additionally, nozzles spray the liquid on the wafer's surface, while a liquid supply element circulates the liquid through a filter to remove residue.

Another significant patent is the "System for cleaning and etching." This system consists of several buffer tanks that store unique chemical solutions for the cleaning and etching process. It includes a loader for loading the wafer and at least one process tank that retains the loaded wafer. This process tank is coupled to the buffer tank to receive the chemical solution and perform the necessary cleaning and etching.

Career Highlights

Throughout his career, Wan-Li Cheng has worked with prominent companies in the semiconductor industry. Notably, he has been associated with Vanguard Semiconductor Corporation and Vanguard International Semiconductor Corporation. His experience in these organizations has contributed to his expertise in wafer processing technologies.

Collaborations

(Section skipped due to space constraints.)

Conclusion

Wan-Li Cheng's innovations in wafer cleaning and etching processes demonstrate his significant contributions to semiconductor technology. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…