The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1999
Filed:
Sep. 18, 1996
Applicant:
Inventor:
Wan-Li Cheng, Hsinchu, TW;
Assignee:
Vanguard Semiconductor Corporation, Taipei, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156345 ;
Abstract
A system for cleaning and etching a wafer. The system includes few buffer tanks to complete the cleaning and etching process. The system further includes a loader for loading the wafer, each buffer tank storing a unique chemical solution. At least one process tank is provided for retaining the loaded wafer, and is coupled to the buffer tank to receive the chemical solution from said buffer tank and to perform the cleaning and etching of the wafer.