Company Filing History:
Years Active: 2003
Title: Innovations of Wan-Jeng Lin in Semiconductor Technology
Introduction
Wan-Jeng Lin is a notable inventor based in Taipei Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in methods that enhance the performance and reliability of semiconductor devices. His innovative approach has led to the development of a unique patent that addresses critical challenges in the industry.
Latest Patents
Wan-Jeng Lin holds a patent titled "Method of preventing silicide spiking." This invention involves the formation of a polysilicon layer on a semiconductor substrate, followed by a collimator physical vapor deposition (PVD) process to create a titanium nitride layer on the polysilicon layer. A rapid thermal nitridation (RTN) process is then performed to strengthen the structure of the titanium nitride layer. Finally, a silicide layer is formed on the barrier layer. This method effectively prevents the occurrence of spikes at the interface between the silicide layer and the polysilicon layer, enhancing the overall performance of semiconductor devices. He has 1 patent to his name.
Career Highlights
Wan-Jeng Lin is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas and contribute to the advancement of semiconductor technologies. His expertise in the field has made him a valuable asset to his team and the company.
Collaborations
Some of Wan-Jeng Lin's coworkers include Jen-Hung Larn and Yung-Chung Lin. Their collaborative efforts in research and development have further propelled advancements in semiconductor technology.
Conclusion
Wan-Jeng Lin's contributions to semiconductor technology through his innovative patent demonstrate his commitment to enhancing the industry. His work continues to influence the development of more efficient and reliable semiconductor devices.