Patterson, NY, United States of America

Walter W Molzen, Jr

This inventor holds 4 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1980-1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walter W Molzen, Jr. Retrieved from https://idiyas.com/inventor/walter-w-molzen-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 69(Granted Patents)


Location History:

  • Patterson, NY (US) (1980 - 1986)
  • Holmes, NY (US) (1991)

Company Filing History:


Years Active: 1980-1991

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4 patents (USPTO):Explore Patents

Title: Walter W. Molzen, Jr.: Innovator in Electron Beam Lithography and Ceramic Inspection

Introduction

Walter W. Molzen, Jr. is a notable inventor based in Patterson, NY (US). He has made significant contributions to the fields of electron beam lithography and ceramic inspection. With a total of 4 patents, his work has advanced the technology used in these areas.

Latest Patents

One of his latest patents is a method for correcting proximity effects in electron beam lithography. This method is suitable for high voltages and/or very dense patterns. It applies both backscatter and forward scatter dose corrections. Backscatter dose corrections are determined by computing two matrices, a 'Proximity Matrix' P and a 'Fractional Density Matrix' F. The Proximity Matrix P is computed using known algorithms. The elements of the Fractional Density Matrix represent the fractional shape coverage in a mesh of square cells superimposed on a pattern of interest. A Dose Correction Matrix D is computed by convolving the P and F matrices. The final backscatter dose corrections are assigned to each shape as area-weighted averages of the D matrix elements or through polynomial interpolation. The D matrix also provides a basis for automatic shape fracturing for optimal proximity correction. Additionally, forward scattering correction may be included in the process, boosting the dose applied to shape i by a factor b.sub.i.

Another significant patent involves the inspection of unsintered single or multilayer ceramics. This patent discloses apparatus and methods for inspecting ceramic specimens containing metal paste patterns. A relatively large surface area of an unsintered ceramic specimen is temporarily electrically contacted with a conforming electrode. This electrode makes non-damaging electrical contact to any metallic paste exposed at the contacted area. The electrical continuity of metallic paste paths is tested by delivering electric charge to surface locations and correlating the collection of charge by the electrode.

Career Highlights

Walter W. Molzen, Jr. has had a distinguished career, primarily working with International Business Machines Corporation (IBM). His innovative work has led to advancements in both electron beam lithography and ceramic inspection technologies.

Collaborations

Throughout his career, he has collaborated with notable colleagues, including Alec N. Broers and Jerome J. Cuomo. These collaborations have contributed to the development of cutting-edge technologies in their respective fields.

Conclusion

Walter W.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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