Company Filing History:
Years Active: 2000-2002
Title: Walter Swanson: Innovator in Substrate Washing Technology
Introduction
Walter Swanson is a notable inventor based in Kikuyo-Machi, Japan. He has made significant contributions to the field of substrate washing technology, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of substrate cleaning processes.
Latest Patents
Walter Swanson's latest patents include an innovative apparatus and method for washing substrates. This substrate washing apparatus features a spin chuck that holds and rotates the substrate. It includes a brushing section with a scrubbing member that contacts the washing surface of the substrate while revolving on its own axis. The apparatus is equipped with a washing liquid supply mechanism that delivers washing liquid through the brushing section onto the substrate's surface. Additionally, a pressure control mechanism regulates the pressing force of the scrubbing member against the substrate. The design also incorporates a moving means that allows the scrubbing member to move radially relative to the substrate, ensuring thorough cleaning.
Career Highlights
Walter Swanson is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative substrate washing technologies.
Collaborations
Walter has collaborated with notable coworkers, including Hideya Tanaka and Kenichi Miyamoto. Their combined expertise has contributed to advancements in substrate washing technology.
Conclusion
Walter Swanson's contributions to substrate washing technology demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the complexities involved in substrate cleaning processes.