Hamburg, Germany

Waldemar Gotze


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1977-1990

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Waldemar Gotze in Radiation Lithography

Introduction

Waldemar Gotze, an accomplished inventor based in Hamburg, Germany, has made significant contributions to the field of radiation lithography. With a total of two patents to his name, he showcases a unique blend of creativity and technical expertise that has influenced manufacturing processes in this specialized industry.

Latest Patents

Waldemar's latest patents highlight his dedication to enhancing the efficiency and precision of lithography. The first patent, "Method of manufacturing a mask for radiation lithography," lays out a method for creating a mask that includes a mask support and a substrate, featuring an absorber layer designed to be structured according to a desired pattern. This absorber layer consists of partly oxidized tungsten, varying in thickness from 0.2 to 1.2 micrometers, and is deposited using cathode sputtering techniques.

His second patent, "Method of and device for providing thin layers by cathode sputtering," details a unique mold and supporting dish for dry-compressed powder targets. This design allows for the efficient evacuation of adsorbed residual gases during the cathode sputtering process, preventing any damage to the powder target structure.

Career Highlights

Waldemar Gotze is currently associated with U.S. Philips Corporation, where he works alongside other notable inventors in the field. His patents reflect his vast knowledge and innovative approach to lithography, marking him as a key figure in the development of cutting-edge manufacturing techniques.

Collaborations

Throughout his career, Waldemar has collaborated with talented professionals such as Ralf-Dieter Boehnke and Angelika M. Bruns. These partnerships have allowed for cross-pollination of ideas and fostered innovations that push the boundaries of radiation lithography.

Conclusion

Waldemar Gotze stands out as an inventive force within the realm of radiation lithography. His patents not only embody technical proficiency but also signify his commitment to pushing the envelope of what is possible in manufacturing. As he continues to innovate at U.S. Philips Corporation, the future looks promising for further advancements influenced by his work.

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