Wakiko Sato

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignees: Tdk Corporation, Tokyo Institute of Technology. Active years: 2021-2025.

USPTO Granted Patents = 6 (Patent Applications = 1)

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 1(Granted Patents)

Company Filing History:

Tokyo Institute of Technology

patents

where one patent can have more than one assignee

Years Active: 2021-2025

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6 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12329036 - Dielectric thin film, dielectric thin film element, piezoelectric actuator, piezoelectric sensor, head assembly, head stack assembly, hard disk drive, printer head and inkjet printer device (2025-06-10),

2. 11999616 - Dielectric thin film, capacitor element, and electronic circuit board (2024-06-04),

3. 11462339 - Dielectric film, dielectric element, and electronic circuit board (2022-10-04),

4. 11445605 - Printed wiring board, multilayer printed wiring board and method for manufacturing printed wiring board (2022-09-13),

5. 11380482 - Dielectric composition and electronic component (2022-07-05),

6. 10991510 - Dielectric membrane and dielectric element (2021-04-27),

Title: Innovations of Wakiko Sato

Introduction

Wakiko Sato is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly in the development of dielectric materials and piezoelectric devices. With a total of six patents to his name, Sato's work has had a considerable impact on various industries.

Latest Patents

Sato's latest patents include a range of innovative technologies. One of his notable inventions is a dielectric thin film that incorporates a metal oxide, which includes bismuth, sodium, barium, and titanium. This dielectric thin film features a tetragonal crystal structure with a (100) plane oriented in a normal direction of the film's surface. Another significant patent involves a capacitive element and a dielectric thin film that exhibits low dielectric loss and high relative permittivity, particularly at low frequencies. This technology utilizes an A-B—O—N oxynitride, represented by the compositional formula ABON.

Career Highlights

Throughout his career, Wakiko Sato has worked with esteemed organizations such as TDK Corporation and the Tokyo Institute of Technology. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research and development in his field.

Collaborations

Sato has collaborated with notable colleagues, including Saori Takahashi and Masahito Furukawa. These partnerships have fostered a creative environment that has led to the advancement of innovative technologies.

Conclusion

Wakiko Sato's contributions to the field of technology through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in dielectric materials and piezoelectric devices, showcasing the importance of innovation in today's technological landscape.