Hong Kong, China

Wai Kei (timothy) Or

This inventor holds 1 USPTO granted patent. Top assignee: High Tech Technology Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wai Kei (timothy) Or. Retrieved from https://idiyas.com/inventor/wai-kei-timothy-or

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Wai Kei (Timothy) Or

Introduction

Wai Kei (Timothy) Or is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of computer architecture, particularly with his innovative approach to the Harvard architecture reduced instruction set computer (RISC). His work emphasizes the importance of debugging capabilities in modern computing systems.

Latest Patents

Wai Kei (Timothy) Or holds a patent for an "Enhanced Harvard architecture reduced instruction set computer (RISC) with debug mode access of instruction memory within a unified memory space." This invention allows a Harvard-architecture computer to simultaneously read instructions and access data through separate buses. The debug module features an external interface for debugging sessions, enhancing the overall functionality and efficiency of the computer system.

Career Highlights

Wai Kei (Timothy) Or is currently employed at High Tech Technology Limited, where he continues to innovate and develop advanced computing solutions. His expertise in computer architecture has positioned him as a valuable asset in the technology sector.

Collaborations

Wai Kei (Timothy) Or collaborates with his coworker, Ka Lok (Roy) Ng, contributing to various projects that push the boundaries of technology and innovation.

Conclusion

Wai Kei (Timothy) Or's contributions to computer architecture and his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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