Menlo Park, CA, United States of America

Waheb Bishara

USPTO Granted Patents = 14 

 

Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 75(Granted Patents)


Location History:

  • Menlo Park, CA (US) (2014 - 2019)
  • San Mateo, CA (US) (2019 - 2024)

Company Filing History:


Years Active: 2014-2025

Loading Chart...
Loading Chart...
14 patents (USPTO):

Title: Waheb Bishara: Innovator in Image Processing and Metrology

Introduction

Waheb Bishara is a prominent inventor based in Menlo Park, California. He has made significant contributions to the field of image processing and metrology, holding a total of 12 patents. His work has been influential in advancing technologies that enhance the accuracy and efficiency of imaging tools.

Latest Patents

Among his latest patents is a display panel portion with a graphical user interface. Another notable patent focuses on optimization-based image processing for metrology. This invention involves acquiring one or more images of a device feature using an imaging tool. A geometrical shape is defined to encompass the relevant pixels of each image, represented in terms of one or more parameters. A cost function is established, with variables comprising these parameters. Numerical optimization is then applied to obtain optimal values for which the cost function is minimized. The optimal values are reported as metrology data pertaining to the device feature.

Career Highlights

Waheb has worked with esteemed organizations such as Applied Materials, Inc. and the University of California. His experience in these institutions has allowed him to collaborate on various innovative projects that push the boundaries of technology.

Collaborations

Some of his notable coworkers include Samer Banna and Aydogan Ozcan. Their collaborative efforts have contributed to the success of several projects in the field of image processing.

Conclusion

Waheb Bishara's contributions to image processing and metrology demonstrate his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in his field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…