This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignees: Fujimi America Inc., Fujimi Incorporated, Other. Active years: 2001-2020.
Location History:
- Sherwood, OR (US) (2001 - 2002)
- Tualatin, OR (US) (2001 - 2020)
Company Filing History:
Years Active: 2001-2020
Title: W Scott Rader: Innovator in Alumina Processing and Polishing Compositions
Introduction
W Scott Rader is a notable inventor based in Tualatin, OR (US). He holds a total of 6 patents that showcase his contributions to the fields of alumina processing and polishing compositions. His innovative work has made significant impacts in various industrial applications.
Latest Patents
Rader's latest patents include advancements in the processing of alumina. He has described stable aqueous dispersions of alumina, methods for decreasing the viscosity of alumina slurries, and techniques for reducing the D50 of alumina slurries. Additionally, he has developed methods to decrease the level of hard packing in alumina slurries, which consist of alumina feed material, water, and a dispersant agent. Another significant patent involves a polishing composition that includes an abrasive, an anticorrosive, an oxidizing agent, an acid, a pH regulator, and water. This composition is designed to maintain a pH within a range of 2 to 5, utilizing colloidal silica or fumed silica as the abrasive, with a primary particle size of no more than 20 nm.
Career Highlights
Throughout his career, Rader has worked with prominent companies such as Fujimi America Inc. and Fujimi Incorporated. His experience in these organizations has allowed him to refine his expertise in materials science and engineering.
Collaborations
Rader has collaborated with notable professionals in his field, including David M Shemo and Toshiki Owaki. These partnerships have contributed to the advancement of his research and innovations.
Conclusion
W Scott Rader's contributions to alumina processing and polishing compositions highlight his role as an influential inventor. His patents reflect a commitment to innovation and excellence in his field.