Ober-Olm, Germany

Volker Seibert

This inventor holds 1 USPTO granted patent. Top assignee: Schott Glas. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Volker Seibert. Retrieved from https://idiyas.com/inventor/volker-seibert-9j5grlma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1999

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Volker Seibert

Introduction

Volker Seibert is a notable inventor based in Ober-Olm, Germany. He has made significant contributions to the field of microchip manufacturing. His innovative work has led to the development of a unique supporting plate for photomasks used in microchip production.

Latest Patents

Volker Seibert holds 1 patent for his invention titled "Supporting plate for a photomask in an apparatus for making a microchip." This apparatus utilizes monochromatic light from a light source, which is directed to a photomask held in a specific position. The light rays are then combined with a lens system and directed to a wafer. The supporting plate is designed to be lightweight while maintaining high dynamic stiffness. It features elongated blind holes along the edges, which are thin-walled and box-like in shape, enhancing its structural integrity.

Career Highlights

Seibert is associated with Schott Glas, a company renowned for its expertise in glass and glass-ceramic materials. His work at Schott Glas has allowed him to focus on innovations that improve microchip manufacturing processes.

Collaborations

Throughout his career, Volker has collaborated with talented individuals such as Ulf Schniering and Konrad Knapp. These partnerships have contributed to the advancement of technology in the microchip industry.

Conclusion

Volker Seibert's contributions to microchip manufacturing through his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…