Palo Alto, CA, United States of America

Vladimir V Makarov


Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2004-2011

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3 patents (USPTO):Explore Patents

Title: Vladimir V Makarov: Innovator in FIB Milling Technology

Introduction

Vladimir V Makarov is a notable inventor based in Palo Alto, CA, with a focus on advancements in milling technology. He holds 3 patents that contribute significantly to the field of semiconductor manufacturing. His work primarily revolves around the milling of copper adjacent to organic low-k dielectrics, which is crucial for modern electronic devices.

Latest Patents

Makarov's latest patents detail innovative apparatus and processes for milling copper. These processes involve directing a charged-particle beam at copper while exposing it to a precursor that enhances the removal of copper relative to the dielectric material. The precursor contains an oxidizing agent with a high sticking coefficient and a long residence time on the copper. It also includes atoms of carbon and silicon to prevent oxidation of the dielectric, while avoiding harmful elements like chlorine, bromine, or iodine. Notable compounds mentioned in his patents include NitroEthanol, NitroEthane, NitroPropane, NitroMethane, and silazane-based compounds such as HexaMethylCycloTriSilazane.

Career Highlights

Throughout his career, Makarov has worked with several prominent companies, including Credence Systems Corporation and Dcg Systems Gmbh. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to significant advancements in the industry.

Collaborations

Makarov has collaborated with notable professionals in his field, including Theodore R Lundquist and Javier Fernandez Ruiz. These collaborations have further enriched his work and expanded the impact of his innovations.

Conclusion

Vladimir V Makarov is a distinguished inventor whose contributions to FIB milling technology have paved the way for advancements in semiconductor manufacturing. His innovative approaches and collaborations continue to influence the industry positively.

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