This inventor holds 2 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2012-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012-2015
Title: Vladimir M Menagarishvili: Innovator in Plasma Processing Technology
Introduction
Vladimir M Menagarishvili is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on developing advanced apparatuses and methods that enhance plasma processing efficiency.
Latest Patents
Menagarishvili's latest patents include an "Apparatus and method for plasma processing" and an "Induction coil, a plasma generator and a plasma generating method." The first patent discloses an apparatus for plasma processing that features a chamber with an external wall and at least one induction coil. This induction coil provides a radio frequency induction field adjacent to the chamber. It includes a terminal connected to a radio frequency power supply and a grounded terminal located centrally within the coil. The second patent describes a plasma generator that utilizes a symmetric induction coil to generate high-quality homogeneous plasma. This innovation allows for the efficient supply of plasma processing gas and high-frequency electricity, resulting in improved plasma generation.
Career Highlights
Vladimir M Menagarishvili is currently employed at Lam Research Corporation, where he continues to advance his research in plasma processing technologies. His work has been instrumental in developing solutions that meet the growing demands of various industries.
Collaborations
Menagarishvili has collaborated with esteemed colleagues such as Georgy K Vinogradov and Tetsuhiko Shimamura. These partnerships have fostered innovation and contributed to the success of his projects.
Conclusion
Vladimir M Menagarishvili is a prominent figure in the field of plasma processing, with a focus on innovative technologies that enhance efficiency and quality. His contributions through patents and collaborations reflect his commitment to advancing this critical area of research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
