This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Vladimir Kvon and His Patent for Contamination Reduction
Introduction
Vladimir Kvon is an inventor associated with Eindhoven, the Netherlands. His patent work includes a system designed to reduce contamination in a plasma environment.
Latest Patents
Kvon is credited with 1 patent: “Contamination Reduction System.” The invention describes a support that holds a patterning system in a radiation beam, a shutter that shields part of the beam, and an electrode positioned between the shutter and the support. Connected to a voltage source, the electrode generates an electric field between itself and the patterning system, helping reduce contamination.
Career Highlights
Kvon is associated with ASML Netherlands B.V., a company working in the semiconductor lithography industry. His patent addresses contamination control in patterning systems operating in a plasma environment.
Collaborations
Kvon’s listed coworkers include Andrei Mikhailovich Yakunin and Marcus Adrianus Van De Kerkhof. Their shared association with the company reflects the collaborative setting in which semiconductor technology is developed.
Conclusion
Vladimir Kvon’s patent focuses on reducing contamination through an electrode-generated electric field, contributing to the development of patterning-system technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile