Norwood, MA, United States of America

Vladimir I Ivakhnenko

This inventor holds 1 USPTO granted patent. Top assignee: Ade Corporation. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vladimir I Ivakhnenko. Retrieved from https://idiyas.com/inventor/vladimir-i-ivakhnenko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2004

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Vladimir I Ivakhnenko: Innovator in Optical Inspection Systems

Introduction

Vladimir I Ivakhnenko is a notable inventor based in Norwood, MA (US). He has made significant contributions to the field of optical inspection systems, particularly in the classification of defects on smooth substrates. His innovative approach has led to advancements in how defects are identified and categorized.

Latest Patents

Ivakhnenko holds a patent for a "Method and apparatus for classifying defects occurring at or near a surface of a smooth substrate." This patent describes a system that classifies defects such as particles, pits, subsurface voids, and mounds based on the signal magnitudes produced by collected light. The method involves consulting a database that relates signal magnitudes to defect sizes, allowing for accurate determination of defect types and sizes.

Career Highlights

Ivakhnenko is associated with Ade Corporation, where he applies his expertise in optical inspection technologies. His work has been instrumental in enhancing the reliability and efficiency of defect classification in various applications.

Collaborations

One of his notable collaborators is John C Stover, with whom he has worked on advancing optical inspection methodologies.

Conclusion

Vladimir I Ivakhnenko's contributions to the field of optical inspection systems demonstrate his innovative spirit and commitment to improving defect classification techniques. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…