The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2004

Filed:

Mar. 12, 2001
Applicant:
Inventors:

Vladimir I. Ivakhnenko, Norwood, MA (US);

John C. Stover, North Attleboro, MA (US);

Assignee:

ADE Corporation, Westwood, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/100 ;
U.S. Cl.
CPC ...
G01N 2/100 ;
Abstract

In an optical inspection system, defects such as particles, pits, subsurface voids, mounds, or other defects occurring at or near the smooth surface of a substrate are classified by type and size based on the magnitude S of a signal produced by collected light for each of a plurality N of different test configurations, yielding a plurality of signal magnitudes S through S . A database is consulted, comprising a relationship of S versus defect size d for each test configuration and for each of a plurality of idealized defect types, so as to determine a defect size d corresponding to each measured signal magnitude S, and an average defect size is determined for each defect type. Signal magnitudes <S > through <S > that would be produced by a defect of the average size are determined for each defect type, and defect type is determined based on a smallest deviation between the measured magnitudes and the determined magnitudes.


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