This inventor holds 1 USPTO granted patent. Top assignee: Techarmonic, Inc.. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: Vivian W Hui: Innovator in Environmental Technology
Introduction
Vivian W Hui is a notable inventor based in San Jose, CA (US). She has made significant contributions to the field of environmental technology, particularly in the destruction of perfluorinated compounds (PFCs). Her innovative approach addresses critical environmental challenges associated with semiconductor processing.
Latest Patents
Vivian holds a patent titled "Methods and systems for the destruction of perfluorinated compounds." This patent outlines methods and systems designed to effectively destroy one or more PFCs in a gas stream. The gas stream can originate from semiconductor processing, where PFCs are commonly found. The process involves reacting the PFCs with steam in the presence of a catalyst, which fragments the PFCs into other compounds that can be easily removed from the gas stream. The catalyst used in this process comprises gallium and may also include zirconium oxide. Additionally, the gas stream can be pre-treated to eliminate substances that could harm the catalyst.
Career Highlights
Vivian W Hui has established herself as a key figure in her field through her innovative work at Techarmonic, Inc. Her dedication to developing environmentally friendly technologies has positioned her as a leader in addressing the challenges posed by harmful compounds in industrial processes.
Collaborations
Vivian collaborates with Christopher Hertzler, contributing to the advancement of their shared goals in environmental technology. Their partnership exemplifies the importance of teamwork in driving innovation.
Conclusion
Vivian W Hui's contributions to the destruction of perfluorinated compounds highlight her commitment to environmental sustainability. Her innovative methods and systems represent a significant step forward in addressing the challenges posed by harmful industrial emissions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile