The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
May. 23, 2007
Christopher Hertzler, San Jose, CA (US);
Vivian W. Hui, San Jose, CA (US);
Christopher Hertzler, San Jose, CA (US);
Vivian W. Hui, San Jose, CA (US);
TecHarmonic, Inc., San Jose, CA (US);
Abstract
Methods and systems for the destruction of one or more PFCs in a gas stream are provided. The gas stream can come from semiconductor processing, for example. The PFCs in the gas stream are reacted with steam in the presence of a catalyst to fragment the PFCs into other compounds that are readily removed from the gas stream. The catalyst comprises gallium, and can additionally comprise zirconium oxide. The gas stream can also be pre-treated prior to reacting the PFCs with steam to remove substances that could be deleterious to the catalyst.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile