Ballston Spa, NY, United States of America

Vittoriano Ruscio

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vittoriano Ruscio. Retrieved from https://idiyas.com/inventor/vittoriano-ruscio

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Vittoriano Ruscio: Innovator in Semiconductor Technology

Introduction

Vittoriano Ruscio is a notable inventor based in Ballston Spa, NY (US), recognized for his contributions to semiconductor technology. With a focus on innovative methods for enhancing semiconductor device performance, Ruscio has made significant strides in the field.

Latest Patents

Ruscio holds a patent for "Backside Wafer Dopant Activation." This patent discloses methods for backside wafer dopant activation using a low-temperature ion implant. The method involves forming a semiconductor device atop a first main side of a substrate and performing a low-temperature ion implant to the second main side of the substrate. This innovative approach allows for improved semiconductor device functionality.

Career Highlights

Vittoriano Ruscio is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to develop and refine techniques that enhance the efficiency and effectiveness of semiconductor devices.

Collaborations

Ruscio has collaborated with talented coworkers, including Qintao Zhang and Samphy Hong, contributing to advancements in semiconductor technology through teamwork and shared expertise.

Conclusion

Vittoriano Ruscio's innovative work in semiconductor technology, particularly through his patent on backside wafer dopant activation, showcases his commitment to advancing the field. His contributions at Applied Materials, Inc. and collaborations with fellow inventors highlight the importance of teamwork in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…