San Jose, CA, United States of America

Vinh Tran

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Applied Material, Inc., Northrop Grumman Systems Corporation. Active years: 2014-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vinh Tran. Retrieved from https://idiyas.com/inventor/vinh-tran-qy1y4cbj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2018

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2 patents (USPTO):Explore Patents

Title: The Innovations of Inventor Vinh Tran

Introduction

Vinh Tran, a talented inventor based in San Jose, CA, has made significant contributions to the field of thermal systems and substrate cleaning methods. With two patents to his name, Tran's work highlights the intersection of innovative engineering and practical applications in electronics.

Latest Patents

Tran's latest inventions include:

1. **Controllable Conductance Thermal Interface**: This thermal transfer system is designed to reduce temperature cycling in electronic devices. It features a thermally conductive device on which the electronic device is mounted, a heat sink, and a thermal rail attached to the heat sink. The system incorporates shape memory alloy (SMA) elements that, when heated above a certain transition temperature, return to a spring-like configuration, increasing the heat transfer contact pressure between the components. This innovation addresses a critical challenge in managing heat in electronic devices, ensuring improved performance and reliability.

2. **Method of Removing Contaminants and Native Oxides from Substrate Surface**: This patent covers methods aimed at cleaning substrate surfaces by removing contaminants and native oxides. The process involves exposing a substrate with an oxide layer to an oxidizing source, which thickens the oxide layer. Subsequently, this thicker oxide layer, along with any contaminants, is removed to reveal a clean substrate surface. This clean surface can then be utilized for further applications, such as the formation of an epitaxial layer.

Career Highlights

Throughout his career, Vinh Tran has collaborated with prominent companies including Northrop Grumman Systems Corporation and Applied Materials, Inc. His contributions within these organizations have helped drive advancements in technology and enhance system efficiencies, particularly in the fields of aerospace and semiconductor manufacturing.

Collaborations

During his professional journey, Tran has worked alongside notable colleagues such as Clint G. Buckman and Alex Chov. Their synergistic efforts have further enhanced the development and implementation of innovative solutions in their respective fields.

Conclusion

Vinh Tran stands out as an inventive mind in the world of technology, with patents that showcase his ability to solve complex problems through innovative design. His work remains influential, contributing significantly to advancements in electronic device thermal management and substrate cleaning methodologies. As he continues to innovate, Tran's inventions will likely pave the way for future developments in engineering and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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